CORPORATE HISTORY
2018
Change Name to “ABLIC Inc.”
- 2017
- High-efficiency SWRs
- 2016
- Established ABLIC Inc.
- 2016
- Medical device ICs
- 2015
- High-power dissipation packages (TO-252-5S)
- 2015
- Wireless power ICs
- 2014
- Timer ICs for automotive use
- 2013
- Magnetism sensor ICs for automotive use
- 2011
- Ultra-small 0.8 x 0.8 mm packages (HSNT)
- 2009
- High-power dissipation packages (HSOP-6)
- 2009
- Power supply ICs for automotive use
- 2005
- Ultra-low voltage operation charge pumps
- 2003
- Ultra-small packages (SNT)
- 2003
- EEPROM for automotive use
- 1999
- Lithium-ion battery protection ICs (Secondary protection)
- 1996
- Began the post process at the Akita plant.
- 1993
- Lithium-ion battery protection ICs / EEPROM
- 1990
- Real-time clock ICs
- 1987
- Completed the 6-inch line for the wafer process.
- 1986
- Non-volatile memories
- 1985
- Temperature sensor ICs
- 1984
- Magnetism sensor ICs
- 1983
- Voltage regulators and voltage detectors
- 1979
- Completed the 4-inch line for the wafer process.
- 1979
- Analog quartz ICs
- 1970
- Completed the 2-inch line for development.
- 1968
- Began CMOS IC R&D.
- 1937
- Established 1937 Daini Seikosha Co., Ltd. (the present-day Seiko Instruments Inc.)
- 1881
- Established K. Hattori (the present-day Seiko Holdings Corporation)
2017 | High-efficiency SWRs | ||
Established SII Semiconductor Corporation | 2016 | 2016 | Medical device ICs |
High-power dissipation packages (TO-252-5S) | 2015 | 2015 | Wireless power ICs |
2014 | Timer ICs for automotive use | ||
2013 | Magnetism sensor ICs for automotive use | ||
Ultra-small 0.8 x 0.8 mm packages (HSNT) | 2011 | ||
High-power dissipation packages (HSOP-6) | 2009 | 2009 | Power supply ICs for automotive use |
2005 | Ultra-low voltage operation charge pumps | ||
Ultra-small packages (SNT) | 2003 | 2003 | EEPROM for automotive use |
1999 | Lithium-ion battery protection ICs (Secondary protection) | ||
Began the post process at the Akita plant. | 1996 | ||
1993 | Lithium-ion battery protection ICs / EEPROM | ||
1990 | Real-time clock ICs | ||
Completed the 6-inch line for the wafer process. | 1987 | ||
1986 | Non-volatile memories | ||
1985 | Temperature sensor ICs | ||
1984 | Magnetism sensor ICs | ||
1983 | Voltage regulators and voltage detectors | ||
Completed the 4-inch line for the wafer process. | 1979 | 1979 | Analog quartz ICs |
Completed the 2-inch line for development. | 1970 | ||
Began CMOS IC R&D. | 1968 | ||
Established 1937 Daini Seikosha Co., Ltd. (the present-day Seiko Instruments Inc.) |
1937 | ||
Established K. Hattori (the present-day Seiko Holdings Corporation) |
1881 |